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P Type , InAs (Indium Arsenide) Wafer , 4”, Prime Grade

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P Type , InAs (Indium Arsenide) Wafer , 4”, Prime Grade

Brand Name : PAM-XIAMEN

Place of Origin : China

MOQ : 1-10,000pcs

Payment Terms : T/T

Supply Ability : 10,000 wafers/month

Delivery Time : 5-50 working days

Packaging Details : Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere

product name : Prime Grade InAs Wafer

Wafer Diamter : 4 inch

Conduction Type : P Type

Grade : Prime Grade

Wafer Thickness : 900±25um

keyword : Indium Arsenide InAs Wafer

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P Type , InAs (Indium Arsenide) Wafer , 4”, Prime Grade

PAM-XIAMEN offers InAs wafer – Indium Arsenide which are grown by LEC(Liquid Encapsulated Czochralski) or VGF(Vertical Gradient Freeze) as epi-ready or mechanical grade with n type, p type or undoped in different orientation(111),(100) or (110). PAM-XIAMEN can provide epi ready grade InAs wafer for your MOCVD & MBE epitaxial application .Please contact our engineer team for more wafer information.

4" InAs Wafer Specification

ItemSpecifications
DopantZinc
Conduction TypeP-type
Wafer Diameter4"
Wafer Orientation(100)±0.5°
Wafer Thickness900±25um
Primary Flat Length16±2mm
Secondary Flat Length8±1mm
Carrier Concentration(1-10)x1017cm-3
Mobility100-400cm2/V.s
EPD<3x104cm-2
TTV<15um
BOW<15um
WARP<20um
Laser markingupon request
Suface finishP/E, P/P
Epi readyyes
PackageSingle wafer container or cassette


What is the InAs Process?
InAs wafers must be prepared prior to device fabrication. To start, they must be completely cleaned to remove any damage that might have occurred during the slicing process. The wafers are then Chemically Mechanically Polished/Plaranrized (CMP) for the final material removal stage. This allows for the attainment of super-flat mirror-like surfaces with a remaining roughness on an atomic scale. After that is completed, the wafer is ready for fabrication.

Thermal properties of InAs Wafer

Bulk modulus5.8·1011 dyn cm-2
Melting point942 °C
Specific heat0.25 J g-1 °C-1
Thermal conductivity0.27 W cm-1 °C-1
Thermal diffusivity0.19 cm2s-1
Thermal expansion, linear4.52·10-6 °C-1

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime Grade

Temperature dependence of thermal conductivity.
n-type sample, no (cm-3): 1. 1.6·1016; 2. 2.0·1017;
p-type sample, po (cm-3): 3. 2.0·1017.

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependences of thermal conductivity for high temperatures
Electron concentration
no (cm-3): 1. 5·1016; 2. 2·1016; 3. 3·1016.
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of specific heat at constant pressure

For 298K < T < 1215K

Cp= 0.240 + 3.97·10-5·T (J g-1°C -1).

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of linear expansion coefficient
(low temperature)
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of linear expansion coefficient
(high temperature)
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependences of Nernst coefficient (transverse Nernst-Ettinghausen effect)
Electron concentration at 77K
no (cm-3): 1. 2.96·1016; 2. 4.46·1016; 3. 8.43·1016; 4. 4.53·1017; 5. 1.56·1018; 6. 2.28·1018; 7. 5·1018; 8. 1.68·1019.

Melting point Tm = 1215 K.
Saturated vapor pressure (in Pascals):

for 950 K - 2·10-3,
for 1000 K - 10-2,
for 1050 K - 10-1.

Thermal properties of InAs Wafer

Bulk modulus5.8·1011 dyn cm-2
Melting point942 °C
Specific heat0.25 J g-1 °C-1
Thermal conductivity0.27 W cm-1 °C-1
Thermal diffusivity0.19 cm2s-1
Thermal expansion, linear4.52·10-6 °C-1

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime Grade

Temperature dependence of thermal conductivity.
n-type sample, no (cm-3): 1. 1.6·1016; 2. 2.0·1017;
p-type sample, po (cm-3): 3. 2.0·1017.

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependences of thermal conductivity for high temperatures
Electron concentration
no (cm-3): 1. 5·1016; 2. 2·1016; 3. 3·1016.
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of specific heat at constant pressure

For 298K < T < 1215K

Cp= 0.240 + 3.97·10-5·T (J g-1°C -1).

P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of linear expansion coefficient
(low temperature)
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependence of linear expansion coefficient
(high temperature)
P Type , InAs (Indium Arsenide) Wafer , 4”, Prime GradeTemperature dependences of Nernst coefficient (transverse Nernst-Ettinghausen effect)
Electron concentration at 77K
no (cm-3): 1. 2.96·1016; 2. 4.46·1016; 3. 8.43·1016; 4. 4.53·1017; 5. 1.56·1018; 6. 2.28·1018; 7. 5·1018; 8. 1.68·1019.

Melting point Tm = 1215 K.
Saturated vapor pressure (in Pascals):

for 950 K - 2·10-3,
for 1000 K - 10-2,
for 1050 K - 10-1.


Are You Looking for an InAs substrate?
PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InAs wafers, send us enquiry today to learn more about how we can work with you to get you the InAs wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!










































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